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International TECHstyle Art Biennial 3 (ITAB)

  • San Jose Museum of Quilts & Textiles 520 South First Street San Jose, CA 95113 USA (map)

International TECHstyle Art Biennial 3 (ITAB) Returning for its third incarnation, ITAB is a juried exhibition of work by artists merging fiber medi­a with new information and communication technologies in their artistic processes, as a medium of artistic expression, and/or in the content of their work. This year jurors Louise Lemieux Bérubé, Patricia Malarcher, and Michael James brought their expert consideration and aesthetic to select work from a new pool of national and international entries.

As a part of their technical and artistic processes artists use techniques of digital jacquard weaving, digital printing, digital photography, manipulation of imagery using various computer programs, laser engraving, or computerized embroidery. As in previous years, some of the work is low tech while creating interesting themes and ideas about the technological world that we live in. ITAB showcases the tools of technology that allow artists to further their artistic visions as they explore the possibilities and inventions of textile art in the 21st century.

Thirty nine works are included by 36 artists from the United States, Canada, France, Hungary, Lithuania, New Zealand, and South Korea. The artists are:

Brigette Amarger
Eszter Bornemisza
Danguole Brogiene
Allison Brown
Melissa English Campbell
Paula Chung
Dotti Cichon
Anita Tovino
Jane Dunnewold
Leslie Falls
Julie Garner
Rob Gonsalves
Anna Kristina Goransson
Sandra Hart
Wen-Ying Huang
Julianna Joos
Robin Koenig
Gay E. Lasher
June Lee
Janice Lessman-Moss
Therese May
Teddy Milder
Patricia Mink
Kristen Neidlinger
Michael Radyk
Kaija Rautiainen
Michael Rohde
Sandra & Michael Rude
Amanda Salm
Won Ju Seo
Kerby Smith
Connie Tiegel
K. Velis Turan
Tali Weinberg
Ealish Wilson